DAĞLI ÖZKOL, E. B.; EYMUR, S.; TUĞLUOĞLU*, N. Investigation of diode parameters of Al/Al2O3/n-Si Schottky diode produced by RF sputtering method according to current-voltage and capacitance-voltage characteristics. JOURNAL OF MATERIALS AND ELECTRONIC DEVICES, [S. l.], v. 2, n. 1, p. 8–13, 2025. Disponível em: https://dergi-fytronix.com/index.php/jmed/article/view/316. Acesso em: 10 feb. 2026.